Professional Profile

Nanofabrication and process integration engineer with 5+ years of hands-on cleanroom experience developing and integrating III–V and lithium niobate on insulator (LNOI) photonic devices. Skilled across the full semiconductor process flow, including electron-beam and optical lithography, ICP-RIE etching, metal deposition, PECVD, thin-film processing, metrology, and device characterization. Proven track record of taking new processes from concept through experimental validation to reproducible multi-lot implementation, with deep expertise in III–V quantum cascade laser (QCL) fabrication, III–V/Ge photonic integration, and LiNbO3 process development. Adept at process optimization, root-cause troubleshooting, SOP development, and data analysis, and experienced in driving cross-functional process integration.

Core Cleanroom & Process Skills

01

Device Platforms

III–V and thin-film lithium niobate photonic devices, from concept to multi-lot fabrication.

  • InAs/AlSb QCLs
  • DFB gratings
  • III–V/Ge integration
  • LiNbO3 (LNOI)
02

Thin-Film Deposition

Metal and dielectric deposition for contacts, insulation, and hard masks.

  • E-beam evaporation
  • Sputtering
  • PECVD
  • SiNx / SiO2 hard masks
03

Lithography & Patterning

High-resolution pattern definition with dose and proximity-effect optimization.

  • Electron-beam (EBL)
  • Photolithography
  • Dose mapping
  • Proximity effect correction
  • Mask / layout prep
04

Etching & Surface Prep

Optimizing profile angle, selectivity, and uniformity on LiNbO3, SiNx, and SiO2.

  • ICP-RIE
  • CHF3/Ar
  • III–V wet etching
  • RCA / SC-1 cleans
05

Metrology & Inspection

Structural, optical, and film characterization to close the loop on every process step.

  • SEM
  • FIB
  • AFM
  • Profilometry
  • Ellipsometry
  • FTIR
06

Packaging & Process Handoff

Device assembly and documentation that lets other teams reproduce the process.

  • Wire bonding
  • Packaging
  • Optical coupling
  • SOP documentation

Research & Industrial Experience

Postdoctoral Researcher — LNOI Process Development 2024 – Present
LAAS-CNRS · Toulouse, France
  • Drove process maturation for LiNbO3 CRIGF devices from single-wafer R&D to multi-lot research production, achieving lot-to-lot reproducibility.
  • Transferred EBL → ICP process flow for TFLN CRIGF devices with sub-100 nm CDs and reproducible lots; authored SOPs and release criteria adopted across teams.
  • Developed LiNbO3 surface preparation enabling exfoliation-free, sub-100 nm SiNx thin-film pattern transfer with improved first-pass success rate; standardized the pre-clean procedure.
  • Optimized ICP–RIE for LiNbO3/SiNx/SiO2: 72° sidewalls, ~2:1 selectivity, ±20 nm CD uniformity.
  • Reduced lithography CD variation by ~30%, decreasing rework and stabilizing downstream etch results.
  • Implemented resist and hard-mask variants, improving etch-rate stability and yield; established a metrology database and workflows for statistical analysis and release audits.
  • Coordinated cross-team process handoff to ensure seamless process integration.
  • LiNbO3
  • SiNx
  • ICP–RIE
  • Yield
  • Process Control
  • SOPs
  • Fab Operations
PhD Researcher — QCL Design, Fabrication & Spectroscopy 2020 – 2023
Univ. of Montpellier & Univ. of Bari · France & Italy
  • Designed and fabricated long-wavelength (10–15 µm) InAs/AlSb DFB QCLs using COMSOL and Nextnano, achieving a record-low threshold current density of 0.6 kA/cm2 through band-structure and grating optimization.
  • Designed and fabricated InAs/AlSb QCLs on Ge substrates, achieving performance parity with native InAs, including characterization of optical output and thermal stability.
  • Developed spin-on-glass (SOG) insulation for QCLs, reducing performance drift by >13%.
  • Optimized dry and wet etching recipes for QCL fabrication, improving yield and reproducibility.
  • Performed comprehensive optical, electrical, and thermal characterization of QCLs, including cryogenic temperature measurements to evaluate low-temperature performance and reliability.
  • Applied QCL technology to highly sensitive breath analysis; led QEPAS/LITES VOC (BTEX) detection projects achieving ppb-level sensitivity using QCLs fabricated in-house.
  • III–V Semiconductors
  • InAs/AlSb
  • DFB QCL Fab
  • Fab Optimization
  • Process Control
  • Trace Gas Sensing
M.Tech Researcher — Optical Sensing 2018 – 2020
IIT (ISM) Dhanbad · India
  • Developed FBG inclination sensors with ±0.008° tilt resolution.
  • Designed temperature-compensated encapsulation for FBG optical sensors for long-term field deployment.
  • FBG Sensors
  • Strain Transfer
  • Tilt Measurement
  • Thermal Compensation

Education

Ph.D. in Physics & Electronics 2020 – 2023
University of Montpellier (France) & University of Bari (Italy)

Thesis: Long-wavelength QCLs for BTEX and propane detection through QEPAS.
Read Thesis

M.Tech in Electronics Engineering 2018 – 2020
Indian Institute of Technology (ISM) Dhanbad
B.Tech in Electronics Engineering 2011 – 2015
Indian Institute of Technology (ISM) Dhanbad

Publications